Machine Learning-Based Modelling in Atomic Layer Deposition Processes - Tien-Chien Jen,Sina Karimzadeh,Oluwatobi Adeleke
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This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
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Description
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
More Information
| Author | Tien-Chien Jen, Sina Karimzadeh, Oluwatobi Adeleke |
|---|---|
| Publisher | Taylor & Francis Ltd (Sales) |
| Release year | 2025 |
| Cover type | Softcover |
| EAN | 9781032386737 |